Writing Nano-Scale Patterns on Insulators Using Variable Pressure Electron-Beam Lithography

Trehalose Glycopolymer Resists Allow Direct Writing of Protein Patterns by Electron-Beam Lithography

Direct-write patterning of multiple proteins on surfaces is of tremendous interest for a myriad of applications. Precise arrangement of different proteins at increasingly smaller dimensions is a fundamental challenge to apply the materials in tissue engineering, diagnostics, proteomics and biosensors. Herein, we present a new resist that protects proteins during electron-beam exposure and its a...

Electron-beam lithography towards the atomic scale and applications to nano-optics

Electron-beam lithography (EBL) is a high-resolution pattern generation technique widely used in research and development. However, EBL resolution has been limited to 4 nm isolated features and 16 nm periodic structures. Furthermore, the physical mechanisms that limit EBL resolution are not quantitatively clear. The fundamental understanding of the resolution limits of EBL is critically importa...

Resolution limits of electron-beam lithography toward the atomic scale.

We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed the resolution limits of this technique by measuring the point-spread function at 200 keV. Furthermore, we measured the energy loss in the resist using electron-energy-loss...

Electron beam lithography on irregular surfaces using an evaporated resist.

An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces...

Dopant Driven Electron Beam Lithography